Wisman High Voltage Power Supply Used in Electron Beam Lithography

Application Specification

Electron beam lithography is the use of electron beam processing equipment and scanning electron microscopy technology to produce semiconductor masks for LSI production. Electron beam lithography is also known as electron beam lithography (EB lithography) or EBL. A mask, also known as a mask, acts like a photographic film as a substrate for transferring the circuit pattern of an electronic component to a chip or other object to be transferred.

In electron beam lithography, an electron beam (E beam) emitted from an electron gun is focused by an electron lens into a very small spot of light. By controlling the movement of the converging electron beam and the movement of the stage according to the lithography pattern, the lithography material is electrolithographed. The control of the electron beam and the stage is based on the electron beam processing equipment and scanning electron microscopy technology.

The electron gun and electron lens required for electron beam lithography equipment require a high-precision and high-voltage power supply to operate.

The Wisman High Voltage Power Supply 3D series is specifically designed to power electron lenses for electron guns and electron beam lithography devices. These high voltage power supplies can also be customized to meet customer requirements.

Wisman has a range of power supplies available for electron beam lithography. Example: 3D; 3DA; EM ; SEM.