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Boron nitride crucible application-electron beam evaporation

Boron nitride crucible application-electron beam evaporation

In semiconductor manufacturing, boron nitride can be used as an etching agent and thin film deposition raw material, acting as a protective layer to prevent damage or contamination of the device.

In addition, boron nitride can also be used as an electron beam evaporation source material for the preparation of various thin film materials.

Details

  • Xiamen, Fujian, China
  • Xiamen Innovacera Advanced Materials Co., Ltd

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