eYc Exhaust emission flow monitoring solution

YUDEN-TECH CO., LTD.
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eYc Exhaust emission flow monitoring solution

Application:

Exhaust gas scrubber uses the contact between gas and liquid, and transporting gas from the contaminants into the liquid, then separate the clean gas from the contaminated liquid to achieve clean air, and use average flow measuring tube or pitot tube collocation differential pressure transmitter to achieve flow monitoring.

Practical application:

Semiconductor manufacturing or electronics frequently etched or cleaned with a large amount of inorganic acid-base solution or gas enthalpy, some chemicals are collected by the system due to volatilization or emissions, the semiconductor industry emission standards should confirm one of the two requirements for removal efficiency or total emissions. For example, pollutants such as nitric acid, hydrochloric acid, phosphoric acid, and hydrofluoric acid, the total emissions of the plant must be less than 0.6 kg/hr, the sulfuric acid needs to be less than 0.1 kg/hr, or the removal efficiency of the scrubber is over 95%.

Note: Unable to prove compliance with emission standards, the control conditions should meet the following requirements: Equipment washing cycle sink pH should be greater than 7、Wetting factor should be greater than 0.1 m2 /hr、Filled section empty tower dwell time should be greater than 0.5 seconds and the specific surface area of the filler should be greater than 90m2 / m3.

eYc Exhaust emission flow monitoring solution <
eYc Exhaust emission flow monitoring solution <

Application: Exhaust gas scrubber uses the contact between gas and liquid, and transporting gas from the contaminants into the liquid, then separate the clean gas from the contaminated liquid to achieve clean air, and use average flow measuring tube or pitot tube collocation differential pressure transmitter to achieve flow monitoring. Practical application: Semiconductor manufacturing or electronics frequently etched or cleaned with a large amount of inorganic acid-base solution or gas enthalpy, some chemicals are collected by the system due to volatilization or emissions, the semiconductor industry emission standards should confirm one of the two requirements for removal efficiency or total emissions. For example, pollutants such as nitric acid, hydrochloric acid, phosphoric acid, and hydrofluoric acid, the total emissions of the plant must be less than 0.6 kg/hr, the sulfuric acid needs to be less than 0.1 kg/hr, or the removal efficiency of the scrubber is over 95%. Note: Unable to prove compliance with emission standards, the control conditions should meet the following requirements: Equipment washing cycle sink pH should be greater than 7、Wetting factor should be greater than 0.1 m2 /hr、Filled section empty tower dwell time should be greater than 0.5 seconds and the specific surface area of the filler should be greater than 90m2 / m3.

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