Metals in industrial effluents: reliable analysis with AAS & ICP‑OES

Efficient workflows, reliable results, confident decisions

When: Thuesday, May 27, 2026 09:00 AM & 16:00 PM CEST
Duration: ~45 min
Language: English
Speakers:
Katrin Klemm, Application Specialist AAS

Industrial wastewater streams, which are a by-product of metal processing, mining, chemical manufacturing, and surface finishing, often contain complex matrices and challenging elemental compositions. Reliable monitoring of metals and key contaminants is essential for environmental compliance, permit requirements, and internal process control. In this web seminar, we provide an expert-level overview of how Atomic Absorption Spectrometry and Optical Emission Spectrometry with inductively coupled plasma (ICP-OES) address the analytical challenges of industrial effluents.

In this web seminar, we will be discussing the development of methods, and we will be providing guidance on how to choose the most suitable instrumentation for AAS and ICP-OES. We will also be highlighting strategies for identifying and compensating for interferences. Participants will learn how Analytik Jena solutions – PlasmaQuant 9200, contrAA 800 and, novAA 800 – deliver superior sensitivity, stability, and cost efficiency. The application examples include synergies for sample types beyond wastewater analysis, such as process samples from the petrochemical, mining, metals, and electroplating industries.

Key learning objectives:
After the web seminar, you will have a clear understanding of the following aspects:

Complexity of industrial wastewater matrices
Need for reliable metal & contaminant monitoring
AAS vs. ICP‑OES: choosing the right technique
Strategies to manage analytical interferences
Performance advantages of Analytik Jena instrumentation
Who should attend?

Laboratory and management personnel at industrial manufacturing sites
Laboratory and management personnel at external contract laboratories
Supervisory authorities and regulatory bodies