NEW: gas pressure controller by HORIBA STEC

Wafer back side cooling system GR-300 series

Overview

The GR-300 series can control gas used to cool the back side of wafers that are fixed in position by an electrostatic chuck system. Suitable for cooling systems using Helium, and gas control of wafer cover gas using Argon.

With the addition of the mass flow sensor option it is possible to monitor gas flow rate.

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Details

HORIBA STEC

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The LF-F/LV-F series has been used in in various fields. The flow rate sensor in the LF-F/LV-F series of fine mass flow controllers for liquids consists of an electronic cooling element that is in contact with a capillary tube, as well as several temperature detection elements. When the liquid flowing, the sensor detects the tempurature rise corresponding to the flow...

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gas pressure controller

GR-300

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