NEW: LCD monitor by HORIBA STEC

Chemical Concentration Monitoring

HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available.

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HORIBA STEC

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Added a high flow rate corresponding to the digital mass flow controller!

MAX 1000L is available. This model is SEC-N170 series. This web page will be coming soon. This technology is used in various industries for the following purposes. -Technologies for manufacturing equipment: liquid crystals, LEDs, solar batteries, power semiconductors, optical fibers, coatings -General industry: Humidity control in air atmospheric gas control, ...

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NEW: gas pressure controller by HORIBA STEC

Wafer back side cooling system GR-300 series

Overview The GR-300 series can control gas used to cool the back side of wafers that are fixed in position by an electrostatic chuck system. Suitable for cooling systems using Helium, and gas control of wafer cover gas using Argon. With the addition of the mass flow sensor option it is possible to monitor gas flow rate.

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Ultra low flow rate control for liquid from 0.001cc/min

The LF-F/LV-F series has been used in in various fields. The flow rate sensor in the LF-F/LV-F series of fine mass flow controllers for liquids consists of an electronic cooling element that is in contact with a capillary tube, as well as several temperature detection elements. When the liquid flowing, the sensor detects the tempurature rise corresponding to the flow...

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